发明名称 RESIN MATERIAL CONTAINING SURFACE-MODIFIED SEMICONDUCTOR ULTRAFINE PARTICLE AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To obtain the subject material enabling not only to control the diameters of particles in a production process but also to disperse the particles in a high concentration and useful as an optical material, a sensor material, etc., by reacting surface-modified semiconductor ultrafine particles having functional groups on the surfaces with a resin. SOLUTION: This resin material is obtained by reacting a compound (a thiol compound having an amino group) having two or more functional groups (amino group, etc.), or a compound having two or more functional groups and a compound having one kind of functional group (thiophenol, etc.), with semiconductor ultrafine particles (silicon ultrafine particles, oxide semiconductor ultrafine particles or 12-16 group ultrafine particles having particle diameters of 1-100 nm, etc.), and subsequently reacting the produced surface-modified semiconductor ultrafine particles with a resin having functional groups (e.g. an amino styrenic resin produced by aminating polystyrene).
申请公布号 JPH1143556(A) 申请公布日期 1999.02.16
申请号 JP19970203280 申请日期 1997.07.29
申请人 MITSUI CHEM INC 发明人 KAWASEKI TAKASHI;MIZUMA KOICHI;HAYASHI TOYOJI
分类号 G02F1/35;B01J19/00;C01G11/02;C01G23/04;C08J3/20;C08K9/04;C08L101/00;G02F1/355;G02F1/361;(IPC1-7):C08K9/04 主分类号 G02F1/35
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