| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a reticle for charged particle beams for solving the problem of complementary patterns that a scattering stencil type reticle has without essentially deteriorating the performance of a device to be manufactured. <P>SOLUTION: In the reticle shown in (f), one sub field is divided into a scattering stencil region A and a membrane region B. In the scattering stencil region A, and the membrane region B, a scattering stencil type pattern and a membrane type pattern are formed, respectively. The former and latter are used for a part having a critical pattern and a pattern without requiring any precision, respectively, thus reducing the need for a complementary pattern and improving throughput. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
