发明名称 COMPOSITION FOR PATTERN FORMATION, AND PATTERN FORMING MATERIAL, APPARATUS, AND METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a composition for pattern formation excellent in adhesion to a substrate such as a substrate for printed wiring formation, good in sensitivity, resolution and obtained pattern shape as well as in strippability from a support, and enabling a high-definition pattern to be formed, and to provide a pattern forming material obtained by using the composition, a pattern forming apparatus equipped with the pattern forming material, and a pattern forming method using the pattern forming material. <P>SOLUTION: The composition for pattern formation contains a compound having a functional group capable of causing chain transfer and a hydrophilic functional group within a molecule, a polymerization inhibitor, a binder, a polymerizable compound and a photopolymerization initiator. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006227224(A) 申请公布日期 2006.08.31
申请号 JP20050039878 申请日期 2005.02.16
申请人 FUJI PHOTO FILM CO LTD 发明人 YOSHIMURA KOSAKU;SATO MORIMASA
分类号 G03F7/004;G03F7/031;H01L21/027;H05K3/06 主分类号 G03F7/004
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