| 摘要 |
1. Methods and apparatus for measuring wavefronts and for de-termining scattered light, and related devices and manufacturing methods. 2.1. The invention relates to a method and apparatus for spatially resolved wavefront measurement on a test specimen, a method and apparatus for spatially resolved scattered light determination, a dif-fraction structure support and a coherent structure support therefor, and also to an objective or other radiation exposure device manufac-tured using such a method, and an associated manufacturing method. 2.2. An embodiment of the invention involves carrying out, for the wavefront measurement, a first shearing measuring operation, which comprises a plurality of individual measurements with at least two first shearing directions and spatially resolved detection of shearing interferograms generated, and an analogous second shearing measuring operation with at least one second shearing direction, at least one second shearing direction being non-parallel to at least one first shearing direction. From the shearing interferograms de-tected, it is possible e.g. to determine a wavefront spatial frequency spectrum and/or a point response of the test specimen and to carry out a spatially resolved scattered light determination by means of the point spread function. 2.3. Use e.g. for the spatially resolved scattered light determination of projection objectives for microlithography.
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