| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a high-quality active matrix substrate excellent in reflectance characteristics at a low cost, without in-plane variations and lot-to-lot variations in reflectance characteristics. SOLUTION: First, as shown in (A), a TFT 8 is formed on an insulating substrate 1. Next, as shown in (B), an insulating film 9 is formed on the insulating substrate 1 and the TFT 8. Then, as shown in (C), a mold 10 having a predetermined surface pattern is pressed against the insulating film 9. Additionally, as shown in (D), a contact hole 11 is formed in the insulating film 9, and, as shown in (E), a reflective display electrode 12 is formed on the insulating film 9. |
