发明名称 Conductive substrate comprising a metal fine particle sintered film
摘要 Provided is a conductive substrate which is prepared by forming a pattern-shaped metal fine particle sintered film such as a copper wiring and the like on a base material of polyimide and the like and which has a high adhesive property with the base material and is provided with an excellent conductivity.;The conductive substrate of the present invention is prepared by printing a coating liquid containing metal or metal oxide fine particles on a base material to form a print layer and subjecting the above print layer to sintering treatment to form a metal fine particle sintered film, wherein a crystallite diameter in the metal fine particle sintered film which is measured by X ray diffraction is 25 nm or more, and a cross section of the metal fine particle sintered film has a void rate of 1% or less.
申请公布号 US9420698(B2) 申请公布日期 2016.08.16
申请号 US201013202425 申请日期 2010.02.19
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 Yoshi Naonobu;Hojo Mikiko
分类号 H05K1/09;H05K3/12;H05K1/03 主分类号 H05K1/09
代理机构 Ladas & Parry LLP 代理人 Ladas & Parry LLP
主权项 1. A conductive substrate prepared by printing a coating liquid containing metal or metal oxide fine particles on a base material to form a print layer and subjecting the above print layer to sintering treatment to form a metal fine particle sintered film, wherein a crystallite diameter in the metal fine particle sintered film which is measured by X ray diffraction is 25 nm or more, and in a cross section transecting the metal fine particle sintered film and base material the metal fine particle sintered film has a void rate of 1% or less.
地址 Tokyo JP