PHOTOMASK AND FABRICATING METHOD USING IT,申请号KR19940004719-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	PHOTOMASK AND FABRICATING METHOD USING IT
摘要
申请公布号	KR0168772(B1)	申请公布日期	1999.02.01
申请号	KR19940004719	申请日期	1994.03.10
申请人	HYUNDAI ELECTRONICS IND. CO.,LTD	发明人	HWANG, JUN
分类号	H01L21/30;G03F1/00;(IPC1-7):H01L21/30	主分类号	H01L21/30
代理机构		代理人
主权项
地址

您可能感兴趣的专利

ELECTRO-OPTIC MODULE AND ELECTRONIC APPARATUS

LIGHT TRANSMISSION PLATE WITH PROJECTION

PRINTER, CONTROL METHOD OF PRINTER, PROGRAM, AND SYSTEM

PIEZOELECTRIC MATERIAL, PIEZOELECTRIC ELEMENT AND ELECTRONIC APPARATUS

METAL OXIDE MESO CRYSTAL AND METHOD FOR MANUFACTURING THE SAME

DIAGNOSTIC SYSTEM, DIAGNOSTIC METHOD, AND PROGRAM

DRIVE CIRCUIT AND VEHICLE LIGHTING DEVICE

SELENIDE GROUP 13 NANOPARTICLE

ELECTRONIC EQUIPMENT

TERMINAL DEVICE AND TERMINAL DEVICE RECEIVING METHOD

METHOD FOR MANUFACTURING EMITTER FOR BACK CONTACT TYPE SOLAR CELL

PRINT CIRCUIT BOARD AND ELECTRONIC DEVICE

SUBSTRATE WITH CONDUCTIVE FILM, METHOD FOR MANUFACTURING THE SAME, AND CONDUCTIVE PASTE FOR POLYIMIDE SUBSTRATE

POWER SUPPLY SYSTEM

INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, AND INFORMATION PROCESSING PROGRAM

DISPLAY DEVICE, DISPLAY DEVICE CONTROL METHOD, AND PROGRAM

COMMUNICATION DEVICE AND COMMUNICATION METHOD

SUCKING/HOLDING JIG, SUCKING/HOLDING DEVICE EQUIPPED WITH THIS JIG, SUCKING/HOLDING METHOD, PROCESSING METHOD OF SUBSTRATE, AND FILM FORMATION METHOD OF SUBSTRATE