发明名称 GALLIUM NITRIDE MATERIALS INCLUDING THERMALLY CONDUCTIVE REGIONS
摘要 The invention includes providing gallium nitride (12) materials including thermally conductive regions and methods to form such materials. The gallium nitride materials may be used to form semiconductor devices. The thermally conductive regions may include heat spreading layers (16) and heat sinks (18). Heat spreading layers (16) distribute heat generated during device operation over relatively large areas to prevent excessive localized heating. Heat sinks (18) typically are formed at either the backside or topside of the device and facilitate heat dissipation to the environment. It may be preferable for devices to include a heat spreading layer (16) which is connected to a heat sink (18) at the backside of the device. A variety of semiconductor devices may utilize features of the invention including devices on silicon substrates and devices which generate large amounts of heat such as power transistors.
申请公布号 WO02069373(A2) 申请公布日期 2002.11.14
申请号 WO2002US05460 申请日期 2002.02.22
申请人 NITRONEX CORPORATION 发明人 BORGES, RICARDO, M.;LINTHICUM, KEVIN, J.;WEEKS, T., WARREN;GEHRKE, THOMAS
分类号 H01L23/34;H01L23/373;H01L29/20;H01L33/00 主分类号 H01L23/34
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