发明名称 METHOD AND APPARATUS FOR IMPROVING PROBING OF DEVICES
摘要 A semiconductor device capable of sustaining a probing test of the type carried out during semiconductor device manufacture the device comprising a plurality of semiconductor layers (104) formed in accordance with a predetermined purpose of the device, the device comprising: a passivation layer (110) formed over the uppermost of the plurality of semiconductors layers; a metallic layer (120) to which bonds (126) may be attached and which includes at least one probing region (118) for carrying out said probing tests; characterised in that the metallic layer includes one or more discontinuities (122) in the surface thereof which act to dissipate any forces generated by a probe being applied thereto, such that the effective area over which the force is dissipated is greater than the area of the probe in contact therewith.
申请公布号 WO2008015499(A1) 申请公布日期 2008.02.07
申请号 WO2006IB54087 申请日期 2006.08.01
申请人 FREESCALE SEMICONDUCTOR, INC.;ST MICROELECTRONICS SAS;ZECRI, MICHEL;GOLDBERG, CINDY;FER, MATHIEU;SCOTT, RUTH 发明人 ZECRI, MICHEL;GOLDBERG, CINDY;FER, MATHIEU;SCOTT, RUTH
分类号 H01L23/485;H01L23/58 主分类号 H01L23/485
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