| 主权项 |
1. A substrate processing system, comprising:
a showerhead that comprises a head portion and a stem portion and that delivers precursor gas to a chamber, wherein the head portion includes an upper surface, a sidewall, a lower planar surface including a plurality of holes, and a cylindrical cavity defined therebetween, wherein the head portion extends radially outwardly from one end of the stem portion towards sidewalls of the chamber and defines a cavity between the upper surface of the head portion and an upper surface of the chamber, wherein the cylindrical cavity of the head portion receives process gas via the stem portion, wherein the process gas in the cylindrical cavity flows though the plurality of holes in the lower planar surface and is distributed into the chamber; and a collar that connects the showerhead to the upper surface of the chamber adjacent to an opposite end of the stem portion, wherein the collar includes a base portion, a stem portion and a plurality of slots, is arranged around the stem portion of the showerhead, and directs purge gas through the plurality of slots into the cavity between the head portion of the showerhead and the upper surface of the chamber and a first plate that includes an opening that receives the stem portion of the showerhead, wherein the first plate is arranged between (i) a lower edge of the stem portion of the collar, below the plurality of slots and (ii) the head portion of the showerhead. |
