发明名称 |
Apparatus and method for pre-conditioning a conditioning disc |
摘要 |
An apparatus and a method for off-line pre-conditioning a conditioning disc that is used in a chemical mechanical polishing process are provided. In the apparatus, an upper platform for mounting a conditioning disc thereto and a lower platform for mounting a polishing pad thereto are engaged together under a pre-set pressure and rotated in opposite directions for a pre-set length of time. The apparatus is effective in removing loose particles from the surface of the conditioning disc such that the possibility of any such particles causing scratches on a wafer surface during a subsequently conducted chemical mechanical polishing process is eliminated. The present invention novel apparatus can be used off-line for pre-conditioning a conditioning disc such that valuable machine time of a chemical mechanical polishing apparatus is not wasted.
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申请公布号 |
US6857942(B1) |
申请公布日期 |
2005.02.22 |
申请号 |
US20000481224 |
申请日期 |
2000.01.11 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD |
发明人 |
LIN YU-LIANG;PENG CHIH-I |
分类号 |
B24B1/00;B24B37/04;B24B53/007;B24B53/12;(IPC1-7):B24B1/00 |
主分类号 |
B24B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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