发明名称 Multiple Beam Pulsed Laser Deposition Of Composite Films
摘要 The present disclosure generally relates to a system and method for multiple beam laser deposition of thin films wherein separate laser beams are used to ablate material from separate targets for concurrent deposition on a common substrate. The targets may include, but not limited to polymers, organics, inorganics, nanocrystals, solutions, or mixtures of materials. A target may be disposed on a tiltable mount to adjust the direction of the ablation plumes. Multiple ablation modes may be concurrently employed at the various targets, including, but not limited to pulsed laser, MAPLE, IR-MAPLE and other modes. One laser may be tunable to an absorption wavelength of a component of the target. The tunable laser may be for example an optical parametric oscillator laser. The system may include a camera and processor for plume axis determination and feedback control of the plume axis by controlling a tilt of a target holder.
申请公布号 US2016230265(A1) 申请公布日期 2016.08.11
申请号 US201414506685 申请日期 2014.10.05
申请人 Dillard University 发明人 Darwish Abdalla;Sarkisov Sergey
分类号 C23C14/24 主分类号 C23C14/24
代理机构 代理人
主权项 1. A system for vacuum deposition of a thin film comprising: a vacuum chamber for housing a substrate for receiving said deposition of said thin film; a plurality of target holders for holding a plurality of respective targets; a plurality of lasers, each laser of said plurality of lasers directed at a respective target of said plurality of respective targets; each laser of said plurality of lasers configured for firing for simultaneous plume development from each target of said plurality of targets; wherein at least one laser of said plurality of lasers comprises a variable wavelength laser tunable to a peak absorbance of a component of at least one target of said plurality of targets.
地址 New Orleans LA US