摘要 |
The present disclosure generally relates to a system and method for multiple beam laser deposition of thin films wherein separate laser beams are used to ablate material from separate targets for concurrent deposition on a common substrate. The targets may include, but not limited to polymers, organics, inorganics, nanocrystals, solutions, or mixtures of materials. A target may be disposed on a tiltable mount to adjust the direction of the ablation plumes. Multiple ablation modes may be concurrently employed at the various targets, including, but not limited to pulsed laser, MAPLE, IR-MAPLE and other modes. One laser may be tunable to an absorption wavelength of a component of the target. The tunable laser may be for example an optical parametric oscillator laser. The system may include a camera and processor for plume axis determination and feedback control of the plume axis by controlling a tilt of a target holder. |