发明名称 |
Method of manufacturing a photovoltaic device |
摘要 |
A method to improve CdTe-based photovoltaic device efficiency is disclosed, the method including steps for removing surface contaminants from a semiconductor absorber layer prior to the deposition or formation of a back contact layer on the semiconductor absorber layer, the surface contaminants removed using at least one of a dry etching process and a wet etching process. |
申请公布号 |
US9450115(B2) |
申请公布日期 |
2016.09.20 |
申请号 |
US201414212584 |
申请日期 |
2014.03.14 |
申请人 |
First Solar, Inc. |
发明人 |
Christensen Scott;Mrozek Pawel;Xiong Gang;Yu San |
分类号 |
H01L21/00;H01L31/0224;H01L31/0392;H01L31/073 |
主分类号 |
H01L21/00 |
代理机构 |
Fraser Clemens Martin & Miller LLC |
代理人 |
Fraser Clemens Martin & Miller LLC ;Dockins Michael E. |
主权项 |
1. A method of manufacturing a photovoltaic device comprising the steps of:
depositing a semiconductor absorber layer adjacent to a substrate; cleaning the semiconductor absorber layer to remove contaminants therefrom using in succession a dry etch followed by a wet etch, the wet etch performed using a solution including HCl/H3PO4 that results in the semiconductor absorber layer having a Te-rich surface and a Cd/Te ratio that is lower than the Cd/Te ratio obtained when the wet etch is performed using a solution including only HCl; in a desorption step, placing the semiconductor layer and the substrate in a vacuum and applying thermal energy to remove surface moisture from the semiconductor absorber layer; and depositing a back contact layer adjacent to the semiconductor absorber layer; wherein the cleaning the semiconductor absorber layer step and the desorption step are performed prior to the deposition of the back contact layer. |
地址 |
Perrysburg OH US |