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发明名称
METHOD OF CLEANING SEMICONDUCTOR WAFER
摘要
申请公布号
KR0157920(B1)
申请公布日期
1999.02.01
申请号
KR19950047887
申请日期
1995.12.08
申请人
LG SEMICONDUCTOR CO., LTD.
发明人
HUH, YUN-JUN;AHN, JAE-YONG
分类号
H01L21/34;(IPC1-7):H01L21/34
主分类号
H01L21/34
代理机构
代理人
主权项
地址
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