| 摘要 |
PROBLEM TO BE SOLVED: To provide a shower head capable of enlarging a deposition rate, and to provide a shower head system, and a film deposition apparatus.SOLUTION: There is provided a shower head (7) including first supply ports (25, 27) and a second supply port (29) for receiving gas supply, and a discharge port (31) for discharging supplied gas into a film deposition chamber (5). In the shower head, the second supply port is provided in the middle of a passage of the gas from the first supply ports to the discharge port inside the shower head.SELECTED DRAWING: Figure 1 |
