| 摘要 |
PROBLEM TO BE SOLVED: To suppress the dispersion of resist sensitivity, etc., based on the time difference between exposure and heat treatment and to improve productivity by executing exposure recording at a large power density by using an objective lens which is large in numerical aperture and simultaneously executing an exposure stage and a heat treatment stage. SOLUTION: The laser beam emitted from a light source laser 1 is modulated by the signal supplied from a signal generator 4 in an optical modulator 5 and the photoresist film 8 of an optical master disk 9 is irradiated with the objective lens 7. A fully solid-state laser consisting of a nonlinear optical crystal is used as the light source laser 1 and the laser beam of 300 nm wavelength is emitted. If the numerical aperture of the objective lens 7 is specified to >=0.85, the spot diameter condensed onto the photoresist film 8 is about 4×10<5> cm. When the film is exposed at a linear speed of about 10<2> to 10<3> cm/s, power density of optical beams of >=1.0×10<4> W/cm<2> is obtd. The temp. of the exposed parts of the photoresist film 8 is raised to >=60 deg.C. |
