| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for easily and reliably cleaning a film distillation apparatus, in particular, a hydrophobic porous membrane in a film distillation apparatus.SOLUTION: According to a method for cleaning a film distillation apparatus, first, washing water R of a room temperature or lower is flown into a raw water chamber 3 thereby washing away a liquid W to be treated remaining in the raw water chamber 3 (first cleaning process). Next, a hot cleaning chemical of 50 to 80°C is circulated in a condensation chamber 4 thereby cleaning the condensation room 4 side (second cleaning process). Subsequently, a cleaning chemical of a room temperature or lower is circulated in the raw water chamber 3 thereby cleaning adsorptive components (impurities) of the liquid W to be treated which are adsorbed onto a hydrophobic porous membrane 2 surface on the raw water chamber 3 side (third cleaning process).SELECTED DRAWING: Figure 6 |
