ELECTRON BEAM EXPOSURE SYSTEM, ELECTRON BEAM EXPOSING METHOD, AND METHOD FOR FABRICATING SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide an electron beam exposure system in which a wafer can be irradiated accurately with a plurality of electron beams. SOLUTION: The electron beam exposure system for irradiating a wafer with a plurality of electron beams comprises a section for generating a plurality of electron beams, a first deflecting section for deflecting the plurality of electron beams independently, a section for acquiring the quantity of current of each of the plurality of electron beams, a section for calculating the correction value of irradiating position for each of the plurality of electron beams, and a section for controlling the deflecting section based on the correction value.