| 发明名称 |
SYSTEM AND METHOD FOR HARMONIC MODULATION OF STANDING WAVEFIELDS FOR SPATIAL FOCUSING, MANIPULATION, AND PATTERNING |
| 摘要 |
An system, and method are disclosed for harmonic modulation of standing wavefields for spatial focusing, manipulation, and patterning of particles, cells, powders, aerosols, colloids, and solids using a multifrequency wave source, a chamber a control module and an analysis module to generate standard wavefields useful for tissue engineering, micro fabrication, therapeutic treatment, and diagnostic tests. |
| 申请公布号 |
US2016208213(A1) |
申请公布日期 |
2016.07.21 |
| 申请号 |
US201615001120 |
申请日期 |
2016.01.19 |
| 申请人 |
Utah Valley University |
发明人 |
Doyle Timothy Edwin;Johnson Blain;Patchett Brian Dale;Sullivan Natalie Charlotte |
| 分类号 |
C12N5/00;G01N33/483;G01H3/10;G01H1/00;G01R29/08;B06B1/02;A61N7/00;A61M37/00;A61N5/06;A61B5/00;A61B18/18;A61B18/04;C12N13/00;G21K5/02 |
主分类号 |
C12N5/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A system for spatially focusing and patterning a standing wavefield, the system comprising:
At least one multifrequency wave source; a chamber configured to generate standing waves; a control module configured to modulate the amplitudes of individual harmonics in order to generate a desired wavefield pattern; and an analysis module to calculate the amplitudes of individual harmonics corresponding to a desired wavefield pattern, material structure, or material configuration. |
| 地址 |
Orem UT US |
