发明名称 |
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE & METHOD FOR MANUFACTURING THE SAME |
摘要 |
a P-type or an N-type semiconductor substrate(11) having a circuit region; more than one P-type wells(13,15) or N- type wells(14,16) formed on the semiconductor substrate(11); p+ regions(21) or n+ regions(19,20) which are the source/drain of the semiconductor substrate, being formed on the well regions; a gate(18) formed on top of the well region(14,15); an electrode connection means formed on top of the p+ regions and the n+ regions; and a pad means(30) connected to one of the n+ regions(20).
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申请公布号 |
KR960016483(B1) |
申请公布日期 |
1996.12.12 |
申请号 |
KR19930016781 |
申请日期 |
1993.08.27 |
申请人 |
SAMSUNG ELECTRONICS CO.,LTD |
发明人 |
KWON, KYU-HYUNG;PARK, KIL-SEO |
分类号 |
H01L27/04;(IPC1-7):H01L27/04 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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