发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE & METHOD FOR MANUFACTURING THE SAME
摘要 a P-type or an N-type semiconductor substrate(11) having a circuit region; more than one P-type wells(13,15) or N- type wells(14,16) formed on the semiconductor substrate(11); p+ regions(21) or n+ regions(19,20) which are the source/drain of the semiconductor substrate, being formed on the well regions; a gate(18) formed on top of the well region(14,15); an electrode connection means formed on top of the p+ regions and the n+ regions; and a pad means(30) connected to one of the n+ regions(20).
申请公布号 KR960016483(B1) 申请公布日期 1996.12.12
申请号 KR19930016781 申请日期 1993.08.27
申请人 SAMSUNG ELECTRONICS CO.,LTD 发明人 KWON, KYU-HYUNG;PARK, KIL-SEO
分类号 H01L27/04;(IPC1-7):H01L27/04 主分类号 H01L27/04
代理机构 代理人
主权项
地址