发明名称 VACUUM PROCESSING SYSTEM AND METHOD OF VACUUM PROCESSING SYSTEM USING THE SAME
摘要 A vacuum processing system and a vacuum processing method using the same are provided to enhance efficiency by suppressing the generation of foreign materials in a sample transfer process. A vacuum processing unit(100) includes a vacuum block(101) and an atmospheric block(102). The atmospheric block includes an atmospheric transfer reactor(108) having an atmospheric transfer robot(109). A plurality of loading plates(111) are installed on a front side of the atmospheric transfer reactor. A cassette(110) is loaded on an upper surface of each of the loading plates. The cassette is used for storing a plurality of samples such as semiconductor wafers. A vacuum transfer vessel(112) includes a vacuum transfer robot positioned therein. The vacuum block includes a plurality of vacuum vessels(103) having a process chamber for etching and processing a sample, a plurality of vacuum vessels(104) having a process chamber for ashing and processing the sample, and a load lock chamber(105) and an unload-lock chamber(106) for handing over the samples between the atmospheric block and the vacuum block.
申请公布号 KR20080066531(A) 申请公布日期 2008.07.16
申请号 KR20070086936 申请日期 2007.08.29
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 ITO TORU;FUJIMOTO KOTARO;MATSUMOTO EIJI;YOSHIDA ATSUSHI;TANAKA KOTA
分类号 H01L21/02 主分类号 H01L21/02
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