发明名称 |
VACUUM PROCESSING SYSTEM AND METHOD OF VACUUM PROCESSING SYSTEM USING THE SAME |
摘要 |
A vacuum processing system and a vacuum processing method using the same are provided to enhance efficiency by suppressing the generation of foreign materials in a sample transfer process. A vacuum processing unit(100) includes a vacuum block(101) and an atmospheric block(102). The atmospheric block includes an atmospheric transfer reactor(108) having an atmospheric transfer robot(109). A plurality of loading plates(111) are installed on a front side of the atmospheric transfer reactor. A cassette(110) is loaded on an upper surface of each of the loading plates. The cassette is used for storing a plurality of samples such as semiconductor wafers. A vacuum transfer vessel(112) includes a vacuum transfer robot positioned therein. The vacuum block includes a plurality of vacuum vessels(103) having a process chamber for etching and processing a sample, a plurality of vacuum vessels(104) having a process chamber for ashing and processing the sample, and a load lock chamber(105) and an unload-lock chamber(106) for handing over the samples between the atmospheric block and the vacuum block.
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申请公布号 |
KR20080066531(A) |
申请公布日期 |
2008.07.16 |
申请号 |
KR20070086936 |
申请日期 |
2007.08.29 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
ITO TORU;FUJIMOTO KOTARO;MATSUMOTO EIJI;YOSHIDA ATSUSHI;TANAKA KOTA |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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