RESIST CONSTITUENT AND PATTERN FORMING METHOD USING THE SAME

摘要

PURPOSE: A resist constituent is provided to perform a top surface imaging process by a small dose of exposure energy and form a pattern by a photolithography process using existing equipment in a short time. CONSTITUTION: The resist constituent is composed of a polymer comprising aromatic group hydrocarbon, of which an average molecular weight is 3000 to 7000. Alternatively, the constituent is composed of a photo acid generator of 1 to 20 weight percent on the standard of the polymer weight. The constituent is coated on a wafer, exposed by the top surface imaging process, and developed using a sililation reagent.