摘要 |
<p>The present invention relates to a coating stress measurement apparatus, and more particularly, to an apparatus for determining the stress generated in a coating layer applied on a substrate during the process of drying the coating layer, by measuring the positional shift of reflected light rays. The coating stress measurement apparatus of the present invention is capable of measuring the coating stress more accurately by controlling the environmental variables such as temperature and humidity in a drying chamber which is isolated from the outside, and allows easy adjustment of the path of light rays by adopting a reflection unit or a distance adjustment unit. Furthermore, the apparatus is advantageous in that an asymmetric bending displacement distribution can be obtained by simultaneously irradiating a number of light rays over the entire area of the substrate through a light distribution unit, and measuring the respective changes of their positions. When the drying process is controlled on the basis of the information thus obtained, the generation of cracks, peeling, rumples and the like can be suppressed.</p> |
申请人 |
SEOUL NATIONAL UNIVERSITY INDUSTRY FOUNDATION;AHN, KYUNG HYUN;LEE, SEUNG JONG;KIM, SUNHYUNG |
发明人 |
AHN, KYUNG HYUN;LEE, SEUNG JONG;KIM, SUNHYUNG |