发明名称 |
Optical proximity correction |
摘要 |
Method for utilizing halftoning structures to manipulate the relative magnitudes of diffraction orders to ultimately construct the desired projected-image. At the resolution limit of the mask maker, this is especially useful for converting strongly shifted, no-0th-diffraction-order, equal-line-and-space chromeless phase edges to weak phase-shifters that have some 0th order. Halftoning creates an imbalance in the electric field between the shifted regions, and therefore results in the introduction of the 0th diffraction order.
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申请公布号 |
US2002001758(A1) |
申请公布日期 |
2002.01.03 |
申请号 |
US20010840307 |
申请日期 |
2001.04.24 |
申请人 |
PETERSEN JOHN S.;CHEN JANG FUNG |
发明人 |
PETERSEN JOHN S.;CHEN JANG FUNG |
分类号 |
G03F1/08;G03F1/00;G03F1/14;G03F7/20;H01L21/027;(IPC1-7):G03C5/00;G03G16/00;G03F9/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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