Cleaning liquid for semiconductor device substrates and method of cleaning substrate for semiconductor devices

摘要

The invention relates to a cleaning liquid for semiconductor device substrates comprising the following components (A) to (D) and a method of cleaning semiconductor device substrates:
(A) at least either one of a polycarboxylic acid and a hydroxycarboxylic acid;(B) a sulfonic acid type anionic surfactant;(C) a carboxylic acid type anionic surfactant; and(D) water.

主权项

1. A cleaning liquid, comprising components (A) to (D):
(A) at least one of a polycarboxylic acid and a hydroxycarboxylic acid; (B) a sulfonic acid type anionic surfactant; (C) a carboxylic acid type anionic surfactant; and (D) water; wherein: component (C) is a compound of formula (1) or a salt thereof:
R—O-(AO)m—(CH2)n—COOH  (1) R is a linear or branched alkyl group having 5 to 20 carbon atoms; AO is at least one of an oxyethylene group and an oxypropylene group; m is 3 to 30; and n is 1 to 6.