发明名称 Lithography rework analysis method and system
摘要 A lithography rework analysis method and system. The method is applied to a system having a network server and a user computer having a browser interface. The method transfers initial data of various machines into the network database. The network database contains rework data of machines performing lithography rework operation. Analysis time node is input to the browser interface and the analysis time node is transferred to the network server. According to the analysis time node, the network server retrieves required data from the network database and displays the data on the browser interface. Rework data residing within the network database includes data table production time, product number, production line code, station code, department code, product code, mask rework pieces, measuring station, production machine, worker name, rework reason code, rework reason title, current status, wafer lot note item, rework time and rework region.
申请公布号 US6805283(B2) 申请公布日期 2004.10.19
申请号 US20020064381 申请日期 2002.07.09
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 LI KUN-PEI;TING HSIU-LAN;LIN PAO-HSING;LI NAI-CHUN
分类号 G03F7/20;H01L21/66;(IPC1-7):G06K13/00 主分类号 G03F7/20
代理机构 代理人
主权项
地址