发明名称 Gas laser processing device with control means for adapting the laser gas pressure to the work to be processed
摘要 A laser processing device (100) includes a laser oscillator (2), a laser machine (11) and a control means (1) for controlling the laser oscillator (2) and the laser machine (11). The control means (1) includes a storage means (50) for storing the processing program (60) for the work to be processed. The storage means (50) has stored therein a required laser gas pressure value (72) for the laser oscillator (2) in the laser processing operation, which value is determined in accordance with the processing specifics the work. The control means (1) includes a laser gas pressure command transmission means (52) for transmitting a laser gas pressure command based on the required laser gas pressure value to the laser oscillator (2). This further improves the processing performance of the laser processing apparatus (100). Further, the control means (1) may include a required laser gas pressure value adjusting means (55) for adjusting the required laser gas pressure value.
申请公布号 EP1747837(A1) 申请公布日期 2007.01.31
申请号 EP20060013833 申请日期 2006.07.04
申请人 FANUC LTD 发明人 TAKAZANE, TETSUHISA;MURAKAMI, TAKAFUMI;MAEDA, MICHINORI;OKAZAKI, RYOMA;EGAWA, AKIRA
分类号 B23K26/06;B23K26/20;B23K26/36;H01S3/036 主分类号 B23K26/06
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