| 摘要 |
A method for fabricating a probe tip is provided to increase yield, reliability, and productivity by controlling the thickness through a chemical mechanical polishing method. In a method for fabricating a probe tip, a sacrificial substrate(4) is deposited on a substrate(3). A photoresist(5-1) is coated, and a photoresist pattern(5-2) including the mold is formed. The probe tip(6-1) is formed by electroplating the mold, and the thickness of the formed probe tip(6-2) is controlled by chemical mechanical polishing. The photoresist pattern is removed, and the probe tip is separated by etching the sacrificial substrate.
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