发明名称 INTERFEROMETER SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING SUCH A SYSTEM
摘要 <p>A composite interferometer system is described, which has a plurality of X and/or Y measuring axes (MAX,1, MAX,2, MAX,3, MAX,4, MAX,5) which co-operate with an X and/or Y measuring mirror (R1, R2) arranged on a object (WH). The interferometer system also has at least one Z measuring axis (MAX,7, MAX,9) which extends partly in an XY plane and co-operates with Z measuring mirrors (R'3, R'4) arranged on the object, and Z reflectors (164, 168). It is thus ensured that, with the use of simple means, a larger number of more accurate and reliable measurements can be performed with the interferometer system.</p>
申请公布号 WO1999028790(A1) 申请公布日期 1999.06.10
申请号 EP1998007670 申请日期 1998.11.27
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址