| 摘要 |
The life of a stepper is prolonged, while achieving a design L/S by changing the L/S values of a reticle with respect to the design L/S to facilitate printing. Etch bias is then conducted to vary etching so that the resulting L/S corresponds to the design L/S. In this way, the load on the stepper mechanism which moves the wafters about with respect to the optics in which the reticle is mounted is reduced.
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