发明名称 Heat treatment apparatus
摘要 PCT No. PCT/JP93/01661 Sec. 371 Date Sep. 19, 1994 Sec. 102(e) Date Sep. 19, 1994 PCT Filed Nov. 12, 1993 PCT Pub. No. WO94/11899 PCT Pub. Date May 26, 1994.A reduction in the air tightness of a reaction chamber of an apparatus due to thermal degradation of a vacuum seal at the connection seal between the reaction chamber and a manifold is prevented. Contamination of the inside of the chamber from particles produced from heating members of the apparatus is reduced. The wall of the reaction chamber extends to a location sufficiently spaced from the lower end of the heater surrounding the reaction chamber. An exhaust port is provided in the wall to exhaust the reaction chamber.
申请公布号 US5509967(A) 申请公布日期 1996.04.23
申请号 US19940256505 申请日期 1994.09.08
申请人 ASM JAPAN K.K. 发明人 KYOGOKU, MITSUSUKE;HONMA, OSAMU
分类号 H01L21/205;H01L21/00;H01L21/22;H01L21/31;H01L21/324;(IPC1-7):C23C16/00 主分类号 H01L21/205
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