| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a PDP in which such high sensitivity as to allow pattern formation even by a direct imaging method is ensured, which is excellent in work efficiency, and by which components of the PDP excellent in pattern shape, such as a dielectric layer, barrier ribs, electrodes, a resistive element, a phosphor, a color filter and a black matrix can be formed favorably, and to provide a transfer film suitable for use in the manufacturing method. <P>SOLUTION: A resist film containing a compound represented by formula (1) [where R1-R5 each independently denote H, halogen, cyano, a 1-4C alkyl or a 6-9C aryl, provided that all of R1-R5 are not simultaneously H], a compound represented by formula (2) [where R6-R9 are each independently a 1-4C alkyl] and a compound represented by formula (3) [where R10 is -S-, -O- or -NR- (R is H or a 1-4C alkyl)] and an inorganic powder-containing resin layer are used on a support film. <P>COPYRIGHT: (C)2007,JPO&INPIT |
