Etching method and etching apparatus.

摘要

A mounting surface of an electrode (11) for mounting an object to be processed thereon is projected to be a curved surface identical to a curved surface obtained by deforming the object to be processed by a uniform load, and etching of the object (12) to be processed is performed. Etching of the object (12) to be processed can be easily and stably performed, thereby improving yield and productivity.