发明名称 |
METHOD FOR FORMING SILVER NANOWIRE PATTERN |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a silver nanowire pattern by which a fine pattern can be formed with a simple fabrication process.SOLUTION: The method for forming a silver nanowire pattern includes: a resist forming step P1 that forms a resist film R1 on a substrate 19, the resist film which can be physically peeled from the substrate 19 after being cured; a patterning step P2 that forms an opening 1k in the resist film R1; a pattern forming step P3 that forms a silver nanowire film 12 in a region including the opening 1k; and a peeling step P5 that forms a silver nanowire pattern in a region corresponding to the opening 1k by peeling and removing the resist film R1.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016152320(A) |
申请公布日期 |
2016.08.22 |
申请号 |
JP20150029259 |
申请日期 |
2015.02.18 |
申请人 |
ALPS ELECTRIC CO LTD |
发明人 |
SATO HIROKI;ABE YUI;SASAKI MAKOTO |
分类号 |
H05K3/04;H01L21/28;H01L21/288;H05K1/09 |
主分类号 |
H05K3/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|