发明名称 METHOD FOR FORMING SILVER NANOWIRE PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a silver nanowire pattern by which a fine pattern can be formed with a simple fabrication process.SOLUTION: The method for forming a silver nanowire pattern includes: a resist forming step P1 that forms a resist film R1 on a substrate 19, the resist film which can be physically peeled from the substrate 19 after being cured; a patterning step P2 that forms an opening 1k in the resist film R1; a pattern forming step P3 that forms a silver nanowire film 12 in a region including the opening 1k; and a peeling step P5 that forms a silver nanowire pattern in a region corresponding to the opening 1k by peeling and removing the resist film R1.SELECTED DRAWING: Figure 1
申请公布号 JP2016152320(A) 申请公布日期 2016.08.22
申请号 JP20150029259 申请日期 2015.02.18
申请人 ALPS ELECTRIC CO LTD 发明人 SATO HIROKI;ABE YUI;SASAKI MAKOTO
分类号 H05K3/04;H01L21/28;H01L21/288;H05K1/09 主分类号 H05K3/04
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