| 摘要 |
<p>PURPOSE:To design a device over a wide range and to eliminate variance in element characteristics by using an insulating film (hard carbon film) which has superior film controllability and mechanical strength and also has a low dielectric constant. CONSTITUTION:On the transparent insulating substrate 11 of glass, plastic, etc., a conductive thin film of Al, Ta, etc., is deposited by vapor deposition method, sputtering method, etc., and patterned to obtain a lower conductor 12. Then the hard carbon film is deposited by a plasma CVD method, etc., and patterned by dry etching to obtain an insulating film 13. Then zinc oxide ZnO is deposited by the sputtering method and patterned to obtain an upper conductor 14, which serves also as a pixel electrode. Consequently, the degree of freedom of wide-range device design is increased and the uniformity of the element characteristics can be improved.</p> |
