Projection optical system, exposure apparatus, and exposure method

摘要

A projection optical system for forming an image of a pattern in a first plane onto a second plane using exposure light in a wavelength region of shorter than 200 nm. When a projection pattern placed in the first plane and having a dark pattern and a light pattern around the dark pattern is projected onto the second plane, an average illuminance in a area where a projected image of the dark pattern is formed in the second plane is 8 or less, where an illuminance of an image of the light pattern around the dark pattern in the second plane is set to be 100.