METHOD FOR PRODUCING PELLICLE FILM, PELLICLE AND PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a pellicle film having high transmittance to EUV light.SOLUTION: There is provided a method for producing a pellicle film which comprises a step of forming a laminated film which contains a nitrogen-containing silicon layer and a main layer and transmits EUV light on a substrate. The step of forming the nitrogen-containing silicon layer includes a step in which after forming a film thicker than the nitrogen-containing silicon layer, the film is thinned so the nitrogen-containing silicon layer has a film thickness of 5 nm or less using xenon difluoride gas.SELECTED DRAWING: Figure 3