| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition that can remove a photoresist, a treatment residue and others from a substrate, in which the composition does not erode a metal exposed to it to an undesirable degree and can selectively remove the residue, and its method. SOLUTION: This composition comprises an organic amine, an optional organic solvent, at least about 0.5 mass% of tannic acid and/or its salt. The method comprises contacting the substrate having the residue with the composition. COPYRIGHT: (C)2006,JPO&NCIPI
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