Wire grid polarizer and backlight unit using the same

摘要

Provided are a wire grid polarizer and a backlight unit using the wire grid polarizer. The wire grid polarizer comprises a first grid layer formed on a substrate and provided with at least one of a first grid pattern, and a second grid layer formed on the first grid pattern and provided with at least one of a second grid pattern made of metal material wherein the first grid layer is made of high molecular substance having a lower refraction index than that of the substrate. By forming a first grid pattern on a substrate using a high molecular substance layer and by forming a metal grid pattern on the first grid pattern, transmission rates of respective wavelengths depending on light angles of incident light are controlled and thereby minimize color variations depending on view angle.

主权项

1. A wire grid polarizer, comprising:
a first grid layer formed on a substrate and provided with at least one first grid pattern; and a second grid layer formed on the at least one first grid pattern and provided with at least one second grid pattern made of metal material, wherein the first grid layer is made of a high molecular substance formed with a polymer and having a refraction index lower than that of the substrate, wherein the substrate is made of a film base material having a predetermined flexibility, wherein a cycle of the second grid pattern is 100 nm through 250 nm and a height of the first grid pattern is 200 nm for providing a maximum value of transmission rate of visible light and a ratio of width to height of the at least one first grid pattern is in a range of 1:0.2-4, wherein a ratio of a width of the first grid pattern to a width of the second grid pattern is at least 1:0.2 and less than 1:1, wherein a length of the second grid pattern is shorter than a length of the first grid pattern, wherein the widths of the first and second grid patterns are measured in a first direction parallel to an upper surface of the substrate, and wherein the lengths of the first and second grid patterns are measured in a second direction parallel to the upper surface of the substrate and perpendicular to the first direction.