METHOD FOR DEPOSITING SILICON NITRIDE FILMS AND SILICON OXYNITRIDE FILMS BY CHEMICAL VAPOR DEPOSITION,申请号KR20047008165-传众专利搜索

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发明名称	METHOD FOR DEPOSITING SILICON NITRIDE FILMS AND SILICON OXYNITRIDE FILMS BY CHEMICAL VAPOR DEPOSITION
摘要
申请公布号	KR20040063161(A)	申请公布日期	2004.07.12
申请号	KR20047008165	申请日期	2002.11.27
申请人		发明人
分类号	C23C16/34;C23C16/30;C23C16/455;H01L21/318	主分类号	C23C16/34
代理机构		代理人
主权项
地址

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