发明名称 Plasma pinch X-ray method
摘要 A method is provided for producing plasma pinch X-rays usable in X-ray lithography. Ionized heated plasma is repeatably generated in a first area directly from solid material without exploding the latter. X-rays are generated in a second area by passing high current through the plasma causing radial inward magnetic field pinching. Accurate control and improved intensity performance, and greater flexibility in selection of X-ray emitting materials, are provided by the separation of the plasma generating and the X-ray pinch generating functions.
申请公布号 US4633492(A) 申请公布日期 1986.12.30
申请号 US19840650903 申请日期 1984.09.13
申请人 EATON CORPORATION 发明人 WEISS, ARNOLD;SCHUTTEN, HERMAN P.;CARTZ, LOUIS;SPELLMAN, GORDON B.;JASKOLSKI, STANLEY V.;WACKMAN, DECEASED, PETER H.
分类号 G03F7/20;H05G2/00;H05H1/04;(IPC1-7):H01J35/00;H05B31/22 主分类号 G03F7/20
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