| 摘要 |
The present invention relates to a substrate liquid processing device capable of preventing the malfunction of a concentration sensor, and preventing dust, extracted from the concentration sensor, from being attached to a substrate. The substrate liquid processing device includes: a processing liquid storage part (38) storing processing liquid to process a substrate (8); a processing liquid supply part (39) supplying the processing liquid to the processing liquid storage part (38); a processing liquid circulating part (40) circulating the processing liquid in the processing liquid storage part (38); a processing liquid discharging part (41) diverged from the processing liquid circulating part (40) to discharge the processing liquid; a concentration sensor (61) installed in the processing liquid discharging part (41), and measuring the concentration of the processing liquid; and a control part (7) controlling the processing liquid supply part. The control part circulates the processing liquid through the processing liquid circulating part, intermittently or consecutively discharges the circulated processing liquid from the processing liquid discharging part at a predetermined timing, supplies new processing liquid from the processing liquid supply part, and measures the concentration of the discharged processing liquid through the concentration sensor at a predetermined timing. |
