发明名称 MANUFACTURE OF MULTISTAGE STRUCTURE USING EMBEDDED ETCHING STOPPING LAYER
摘要 PROBLEM TO BE SOLVED: To manufacture a multistage fine lithographic structure, such as a Fresnel lens for acoustic ink printing which is economical with high reliability. SOLUTION: Layers 602, 606, 610 of SiON as a Fresnel lens material are deposited by a known method and the chemical composition for depositing material is selectively altered to form middle etching stopping layers 604, 608 at appropriate positions. The depositing process is not interrupted for the end half process. The objective multistage structure, that is, a Fresnel lens is then formed by masking, patterning and etching. Desired uniformity is easily obtained, unequal stage heights are allowed and the degree of requirements to the selectivity of regions to be etched, and the thickness of etching stopping layers can be relieved.
申请公布号 JP2000181076(A) 申请公布日期 2000.06.30
申请号 JP19990354057 申请日期 1999.12.14
申请人 XEROX CORP 发明人 SMITH DONALD L;JAMES C MICHAELSON JR;HADIMIOGLU BABUR B;MARTIN G RIMU
分类号 H01L21/306;G03F7/00;G03F7/20;G03F7/26;G03F7/40;(IPC1-7):G03F7/26 主分类号 H01L21/306
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