发明名称 |
PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING A CONDUCTIVE BAFFLE |
摘要 |
RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing a bypass current flow path. The bypass current flow path avoids the pumping port in the chamber floor and avoids the wafer slit valve, and is provided by a conductive annular baffle grounded to and extending from the wafer pedestal. Current flow below the level of the annular baffle can be blocked by providing one or more insulating rings in the sidewall or by providing a dielectric sidewall.
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申请公布号 |
US2009025879(A1) |
申请公布日期 |
2009.01.29 |
申请号 |
US20070828713 |
申请日期 |
2007.07.26 |
申请人 |
RAUF SHAHID;COLLINS KENNETH S;BERA KALLOL;RAMASWAMY KARTIK;NGUYEN ANDREW;SHANNON STEVEN C;WONG LAWRENCE;KOBAYASHI SATORU;DETRICK TROY S;CRUSE JAMES P |
发明人 |
RAUF SHAHID;COLLINS KENNETH S.;BERA KALLOL;RAMASWAMY KARTIK;NGUYEN ANDREW;SHANNON STEVEN C.;WONG LAWRENCE;KOBAYASHI SATORU;DETRICK TROY S.;CRUSE JAMES P. |
分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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