发明名称 MULTILAYER FILM REFLECTING MIRROR, EUV EXPOSURE DEVICE AND SOFT X-RAY OPTICAL APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a multilayer film reflecting mirror capable of preventing diffusion of noble metals into the multilayer film, and keeping oxidation prevention function for long hours, while using the noble metals as an oxidation prevention agent for the multilayer film reflecting mirror. <P>SOLUTION: An Mo/Si multilayer film is formed on a substrate 5 by a sputtering method. A Cr layer 2 is formed as a diffusion prevention layer by the sputtering method on the 46th Si layer 3. The substrate is cooled by water and kept at a room temperature during film formation. Then, a Pt layer 1 is formed as an oxidation prevention layer by the sputtering method on the Cr layer 2. Since a comparatively firm interatomic bond can be acquired on the interface between the oxidation prevention layer comprising a noble metal material and the diffusion prevention layer including Cr or Ti, diffusion of noble metal atoms from the oxidation prevention layer into a reflecting film can be prevented effectively. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006170812(A) 申请公布日期 2006.06.29
申请号 JP20040363913 申请日期 2004.12.16
申请人 NIKON CORP 发明人 MURAKAMI KATSUHIKO
分类号 G21K1/06;G02B5/08;G03F7/20;G21K5/02;H01L21/027 主分类号 G21K1/06
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