| 摘要 |
<p>PROBLEM TO BE SOLVED: To accurately and automatically align a semiconductor substrate with a mask, without using a photoresist by positioning the substrate and mask, utilizing a light from the same optical source. SOLUTION: For forming a thin film on a semiconductor substrate or dry etching it, in a step for laying a mask having specified holes on the substrate, the substrate and mask are aligned, utilizing lights from identical optical sources 5, 6. A semiconductor substrate having optically detectable markers 12, 13 is mounted in a holder 8, the holder is moved to search for the markers 12, 13 by irradiation with the lights from the sources 5, 6, thereby positioning the substrate. A mask having the same markers is mounted on a mask carrier and moved to search for the mask markers by irradiation with the lights from the identical sources 5, 6, thereby half automatically aligning the substrate with the mask.</p> |
