THINNER COMPOSITION FOR REMOVING PHOTORESIST

摘要

A thinner composition for removing photoresist used in manufacturing semiconductor or liquid crystal display is provided to efficiently and rapidly remove photoresist adhered in undesired portions of a substrate regardless of kinds of photoresist by comprising alkyl ethanoate and fluorinated acrylic copolymer. The composition principally comprises (a) alkyl ethanoate and (b) fluorinated acrylic copolymer in amount of 0.001 to 1.0wt. parts relative to 100wt. parts of alkyl ethanoate. The fluorinated acrylic copolymer has weight average molecular weight of 1,000 to 10,000. The alkyl ethanoate is selected from a group consisting of methyl ethanoate, ethyl ethanoate, isopropyl ethanoate, normal propyl ethanoate and butyl ethanoate.