| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition which can suppress contamination of a baking furnace, a photomask, and the like, due to sublimation of a radiation-sensitive polymerization initiator component, will not generates foreign substances in a developer, also excels in developability and pattern profile, and is used for forming a colored layer of a color filter. <P>SOLUTION: The radiation-sensitive resin composition for colored layer formation comprises (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a radiation-sensitive polymerization initiator that uses a compound, represented by general formula (1) as an essential component. <P>COPYRIGHT: (C)2008,JPO&INPIT |
