| 发明名称 | Substrate table, a lithographic apparatus and a device manufacturing method | ||
| 摘要 | A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface. | ||
| 申请公布号 | US9454089(B2) | 申请公布日期 | 2016.09.27 |
| 申请号 | US201615048826 | 申请日期 | 2016.02.19 |
| 申请人 | ASML NETHERLANDS B.V. | 发明人 | Ten Kate Nicolaas;Lafarre Raymond Wilhelmus Louis |
| 分类号 | G03B27/52;G03B27/58;G03F7/20 | 主分类号 | G03B27/52 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A table for a lithographic apparatus, the table comprising: an outlet opening; a catchment opening at an upper surface of the table, the catchment opening in fluid communication with the outlet opening; and a porous structure in a flow path between the catchment opening and the outlet opening, wherein the porous structure is configured to stop liquid flow and accumulate liquid above the porous structure. | ||
| 地址 | Veldhoven NL | ||