APPARATUS FOR DEVELOPING A SEMICONDUCTOR WAFER

摘要

An apparatus and a method for developing a semiconductor wafer are provided to reduce a development time of the semiconductor wafer by facilitating the reaction between photoresist and developer. A semiconductor wafer(W) coated with photoresist is seated on a chuck(10). A developer coater(20) is disposed over the chuck to coat a developer on the semiconductor wafer coated with the photoresist. A nitrogen supplier(30) is disposed over the chuck to supply nitrogen onto the semiconductor wafer coated with the developer, in which the nitrogen supplier is attached to the developer coater. The nitrogen supplier has a nozzle for supplying the nitrogen onto the semiconductor wafer, the nozzle having plural holes for supplying the nitrogen onto the semiconductor wafer.